Exposure mask and method for forming semiconductor device using the same,申请号KR20090038931-传众专利搜索

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发明名称	Exposure mask and method for forming semiconductor device using the same
摘要
申请公布号	KR101087785(B1)	申请公布日期	2011.11.30
申请号	KR20090038931	申请日期	2009.05.04
申请人		发明人
分类号	H01L21/027	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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