CLEANING APPARATUS FOR SUBSTRATE AND CLEANING METHOD THEREOF

摘要

PURPOSE: A substrate cleaning apparatus and a substrate cleaning method using the same are provided to improve detergency by cleaning a substrate using a steam cleaning device in a cleaning unit and to prevent the generation of stain. CONSTITUTION: A substrate cleaning apparatus comprises a substrate transportation unit(220) and a steam cleaning device(230). The substrate transportation unit transfers a substrate. The steam cleaning device comprises first, second, and third slit nozzles(237-239) in order to clean the substrate. The steam cleaning device sprays steam and compressed air to an opposite direction of a transfer direction of the substrate. The second slit nozzle sprays the steam and the first slit nozzle is located on the front end of the transfer direction of the substrate. The third slit nozzle is located on the rear end of the transfer direction of the substrate. The second slit nozzle is located between the first slit nozzle and the third slit nozzle.