发明名称 VERFAHREN ZUR BEREITSTELLUNG EINER STRUKTURIERTEN METALLSCHICHT MIT HOHER LEITFÄHIGKEIT
摘要 <p>Disclosed is a method for making a metal pattern with high conductivity comprising providing a patterned substrate comprising a patterned catalyst layer on a base substrate by a thermal imaging method followed by plating to provide the metal pattern. The metal patterns provided are suitable for electrical devices including electromagnetic interference shielding devices and touchpad sensors.</p>
申请公布号 AT529266(T) 申请公布日期 2011.11.15
申请号 AT20080842620T 申请日期 2008.10.23
申请人 E. I. DU PONT DE NEMOURS AND COMPANY 发明人 GAO, FENG;JOHNSON, LYNDA;KEUSSEYAN, ROUPEN;KEYS, DALEN;MALAJOVICH, IRINA;SCHIFFINO, RINALDO;ZUMSTEG, FREDRICK
分类号 B41M5/382;B41M5/392;H05K3/04;H05K3/18;H05K9/00 主分类号 B41M5/382
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