发明名称 METHOD FOR MEASURING OPTICAL CHARACTERISTICS AND APPARATUS, AS WELL AS EXPOSURE METHOD AND APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To simplify a configuration of a part of a measuring apparatus disposed on the image plane side of an optical system and measure optical characteristics of the optical system. <P>SOLUTION: A characteristics measuring apparatus 20 comprises: a L&S pattern 21A and an L&S pattern 23A disposed on the object plane and image plane sides of a projection optical system PL; an illumination optical system ILS to illuminate the L&S pattern 21A and through the projection optical system PL the L&S pattern 23A; and a light reception system 30 to receive reflected light from the L&S pattern 23A through the projection optical system PL and the L&S pattern 21A, and imaging characteristics of the projection optical system PL are determined based on detection signals obtained from the light reception system 30 when images of the L&S pattern 21A and the L&S pattern 23A are moved relatively. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011222921(A) 申请公布日期 2011.11.04
申请号 JP20100093586 申请日期 2010.04.14
申请人 NIKON CORP 发明人 FUJII TORU
分类号 H01L21/027;G01M11/02;G03F7/20 主分类号 H01L21/027
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