发明名称 RADIATION-SENSITIVE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition capable of accurately forming a pattern having excellent resolution and a desired shape.SOLUTION: The radiation-sensitive composition contains a polysiloxane (A), a compound (B) having at least one of a structure having two or more monovalent anions and a structure having two or more monovalent cations and a solvent (C).
申请公布号 JP2011215385(A) 申请公布日期 2011.10.27
申请号 JP20100083852 申请日期 2010.03.31
申请人 JSR CORP 发明人 DEI KEI;YASUDA YOSHITOMO;HASEGAWA KOICHI
分类号 G03F7/075;C08G77/04;G03F7/004 主分类号 G03F7/075
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