发明名称 |
RADIATION-SENSITIVE COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition capable of accurately forming a pattern having excellent resolution and a desired shape.SOLUTION: The radiation-sensitive composition contains a polysiloxane (A), a compound (B) having at least one of a structure having two or more monovalent anions and a structure having two or more monovalent cations and a solvent (C). |
申请公布号 |
JP2011215385(A) |
申请公布日期 |
2011.10.27 |
申请号 |
JP20100083852 |
申请日期 |
2010.03.31 |
申请人 |
JSR CORP |
发明人 |
DEI KEI;YASUDA YOSHITOMO;HASEGAWA KOICHI |
分类号 |
G03F7/075;C08G77/04;G03F7/004 |
主分类号 |
G03F7/075 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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