APPARATUS FOR CHEMICAL VAPOR DEPOSITION,申请号KR20100036576-传众专利搜索

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发明名称	APPARATUS FOR CHEMICAL VAPOR DEPOSITION
摘要
申请公布号	KR20110116904(A)	申请公布日期	2011.10.26
申请号	KR20100036576	申请日期	2010.04.20
申请人	LIGADP CO., LTD.	发明人	LEE, CHANG YEOB;JEONG, JIN YEOL
分类号	H01L21/205	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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