PHOTOSENSITIVE RESIN COMPOSITION

摘要

The present invention relates to a photosensitive resin composition. More specifically, the present invention relates to a positive photosensitive resin composition for the formation of an organic interlayer dielectric layer, wherein the photosensitive resin composition comprises one or more kinds of compounds selected from the group consisting of a) a UV stabilizer, b) a radical scavenger, and c) an antioxidant. The photosensitive resin composition of the present invention is used as an organic interlayer dielectric layer of TFT-LCDs to be able to improve problems of the leaning phenomenon of liquid crystals in case of overexposure in a process for photoalignment of liquid crystals and to easily control resolution of patterns, and is particularly suitable for the formation of a flattened organic interlayer dielectric layer.