| 发明名称 |
RESIN COMPOSITION FOR USE IN AN ORGANIC THIN-FILM TRANSISTOR INSULATION LAYER, OVERCOAT INSULATION LAYER, AND ORGANIC THIN-FILM TRANSISTOR |
| 摘要 |
<p>The disclosed resin composition for use in an organic thin-film transistor insulation layer makes it possible to manufacture an organic thin-film transistor that exhibits little hysteresis and has a threshold voltage with a low absolute value. Said resin composition contains: (A) a macromolecular compound that has a repeating unit having a group that contains a fluorine atom; and (B) an active hydrogen compound which is a fluorine resin.</p> |
| 申请公布号 |
WO2011125691(A1) |
申请公布日期 |
2011.10.13 |
| 申请号 |
WO2011JP57938 |
申请日期 |
2011.03.30 |
| 申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED;YAHAGI, ISAO |
发明人 |
YAHAGI, ISAO |
| 分类号 |
H01L29/786;C08F212/14;C08F220/34;G09F9/30;H01L21/336;H01L51/05;H01L51/30 |
主分类号 |
H01L29/786 |
| 代理机构 |
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