发明名称 |
SEMICONDUCTOR ANNEALING DEVICE, METHOD OF ANNEALING SEMICONDUCTOR, AND STORAGE MEDIUM |
摘要 |
PROBLEM TO BE SOLVED: To provide a novel semiconductor annealing device, a method of annealing a semiconductor, and a storage medium to be used when annealing the semiconductor.SOLUTION: The semiconductor annealing device includes: a first laser light source for emitting a first laser pulse; a second laser light source for emitting a second laser pulse; a composite optical system for superposing the first laser pulse and the second pulse laser pulse on the same optical axis; a processing stage for holding a processing object; a waveguide optical system for transmitting the first and second laser pulses superposed on the same optical axis in the composite optical system to the processing stage; a controller for controlling emission of the first laser pulse by the first laser light source and that of the second laser pulse by the second laser light source; and a memory for storing the data including a relationship between the depth in which silicon is melted and the delay time when two laser pulses are incident onto the silicon with a delay time interval. |
申请公布号 |
JP2011199104(A) |
申请公布日期 |
2011.10.06 |
申请号 |
JP20100065822 |
申请日期 |
2010.03.23 |
申请人 |
SUMITOMO HEAVY IND LTD |
发明人 |
SAKAMOTO MASAKI;TOGAMI MAKOTO |
分类号 |
H01L21/268 |
主分类号 |
H01L21/268 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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