发明名称 TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a transistor that has high current driving force and high cutoff characteristics, and to provide a method of manufacturing the same. SOLUTION: The transistor 100 in one embodiment includes: a graphene film 10 which has a conductor region 10a and a semiconductor region 10b where atoms are bonded to a surface, and functions as a channel; and a gate electrode 12 formed on the graphene film 10 with a gate insulating film 11 interposed, wherein a tunnel current of a Schottky junction that is formed by the conductor region 10a and semiconductor region 10b is used for switching operation. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011192667(A) 申请公布日期 2011.09.29
申请号 JP20100054853 申请日期 2010.03.11
申请人 TOSHIBA CORP 发明人 MIYATA TOSHITAKA;NAKABARAI SHU;KAWANAKA SHIGERU;ADACHI KANNA
分类号 H01L29/66;H01L21/28;H01L29/06;H01L29/786;H01L51/05;H01L51/30;H01L51/40 主分类号 H01L29/66
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