CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

摘要

PROBLEM TO BE SOLVED: To provide a chemically amplified positive resist composition featuring a high resolution, reduced line edge roughness, and a minimized variation of line width with changing temperature, and a pattern forming process using the same.

SOLUTION: The chemically amplified positive resist composition comprises a polymer (PB) comprising specific recurring units having an aromatic ring on a side chain and specific recurring units having a nitrogen atom on a side chain, and a polymer (PA) comprising specific recurring units having the sulfonium salt of a sulfonic acid on a side chain and recurring units having an acidic side chain protected with an acid decomposable protective group.

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