发明名称 METHOD FOR TREATING SUBSTRATE, METHOD FOR FABRICATING DISPLAY ELEMENT AND APPARATUS FOR FABRICATING DISPLAY ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a method for treating substrate capable of suppressing enlargement of the whole apparatus. SOLUTION: The method for treating substrate for subjecting a supplied substrate FB to prescribed treatment and recovering the substrate includes: a formation process of forming the substrate endlessly by bonding one end of the substrate to the other end thereof; a conveyance process of conveying the endless substrate; a treatment process of subjecting the conveyed substrate to a prescribed treatment; and a recovery process of recovering the substrate subjected to the prescribed treatment. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011191640(A) 申请公布日期 2011.09.29
申请号 JP20100059271 申请日期 2010.03.16
申请人 NIKON CORP 发明人 MIYAJI AKIRA
分类号 G09F9/00;G09F9/30;H01L51/50;H05B33/10 主分类号 G09F9/00
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