发明名称 |
Glass tube processing apparatus |
摘要 |
In a glass processing method according to the invention, in the case of performing chemical vapor deposition or diameter shrinkage of a substrate glass tube G by relatively moving a heating furnace 20 comprising a heating element 21 for annularly enclosing the circumference of the substrate glass tube in a longitudinal direction of the substrate glass tube G with respect to the substrate glass tube G in which an outer diameter is 30 mm or more and a wall thickness is 3 mm or more and is less than 15 mm and an ovality of the outer diameter is 1.0% or less using a glass processing apparatus 1, a temperature of at least one of the heating element 21 and the substrate glass tube G is measured and the amount of heat generation of the heating element 21 is adjusted based on the measured temperature.
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申请公布号 |
US8024945(B2) |
申请公布日期 |
2011.09.27 |
申请号 |
US20090622056 |
申请日期 |
2009.11.19 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
NAKANISHI TETSUYA;ONISHI MASASHI;YOKOKAWA TOMOYUKI;HIRANO MASAAKI;TAIRA NOBUYUKI |
分类号 |
C03B23/08;C03B37/07;C03B23/043;C03B23/045;C03B37/00;C03B37/012;C03B37/018 |
主分类号 |
C03B23/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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