发明名称 MASK HOLDING APPARATUS AND THIN FILM FORMING APPARATUS
摘要 <p>Disclosed is a mask holding apparatus, which can hold, without making wrinkles, a single mask that is not provided with a mask frame, and which transfers the mask onto a substrate or adjusts alignment of the mask with the substrate. A mask holding/aligning apparatus (5), which holds the sheet-like mask that contains a magnetic material and has an opening for pattern-forming a thin film on the substrate, is provided with a mask magnetization plate (54), which, by means of a plurality of permanent magnets disposed on one surface side, magnetizes the mask on the other surface side. The permanent magnets are configured such that, on the other surface side of the mask magnetization plate (54), the distribution of a magnetic field in a first region and the distribution of a magnetic field in a second region are different from each other.</p>
申请公布号 WO2011114829(A1) 申请公布日期 2011.09.22
申请号 WO2011JP53318 申请日期 2011.02.17
申请人 TOKYO ELECTRON LIMITED;ONO, YUJI;HAYASHI, TERUYUKI;TOBE, YASUHIRO;SHIMO, FUMIO 发明人 ONO, YUJI;HAYASHI, TERUYUKI;TOBE, YASUHIRO;SHIMO, FUMIO
分类号 C23C14/04 主分类号 C23C14/04
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