| 摘要 |
PROBLEM TO BE SOLVED: To provide a coating device capable of uniformly coating a liquid with high degree of viscosity on the surface of a base, as well as a coating method. SOLUTION: Since the rotary symmetrical axis C and the vertical axis V of a rotary shaft 3 which are orthogonal to the coating surface of a silicon wafer W, have the angleθ, the coating surface of the silicon wafer W which is orthogonal to the rotary symmetrical axis C has the angleθto a horizontal surface 101, an upper surface 200 and a lower surface 201, and is slightly inclined at not less than 0°to not more than 0.5°. Further, a dropped highly viscous resist R which tends to spread by the centrifugal force from the rotational center 0, receives the gravitational force toward the rotating center 0 by the balance of the gravitational force and the surfacial tension of the resist R, since the spin head 1 rotates slightly askew. Thus, the highly viscous resist R can be coated uniformly. In addition, the rotary symmetrical axis C and the vertical axis V of the rotary shaft 3 has the fixed angleθ, so that the resist coating device 10 is structurally simplified. COPYRIGHT: (C)2011,JPO&INPIT
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