| 摘要 |
PROBLEM TO BE SOLVED: To provide a new device using a new carbon structure having a nano scale, and to provide a carbon nano wall and a manufacturing method of the carbon nano wall. SOLUTION: In the device, a conductive region is formed with the carbon nano wall as a substrate. The carbon nano wall can comprise a hetero atom or does not comprise the hetero atom. In the carbon nano wall comprising the hetero atom, material gas comprising the hetero atom and a carbon source can be manufactured by a plasma CVD method. COPYRIGHT: (C)2007,JPO&INPIT |
