| 摘要 |
<p>PURPOSE: A method and apparatus for controlling a lithography device are provided to efficiently maintain and repair a lithography apparatus by considering overlay errors to calculate the specific fingerprints of scanner errors. CONSTITUTION: A scanner(1006) comprises several sub systems. Overlay errors are generated due to the sub systems during an exposure process. The overlay errors are measured by using a scatterometer. The different sub sets of the evaluated model parameters are individually determined from the overlay measurements through modeling. Each sub set is related to the overlay errors due to the specific sub system corresponding to the lithography device. An exposure is controlled in a scanner by controlling a specific sub system(1008,1010,1012) of the scanner by using the sub set corresponding to the evaluated model parameters(1026).</p> |
