| 摘要 |
The patent describes a vapor-phase deposition source comprising a vessel equipped with two zones. The first zone is for the production of vapor. It is equipped with a receptacle for the material and means for heating the material placed in the receptacle. The second is a diffusion zone comprising a vessel communicating with the production zone and equipped with at least one orifice so that the vapor-phase material is transmitted towards the exterior of the vessel through the orifice. The source is characterized in that, on the one hand, the room comprises an inner wall and an outer envelope defining an intermediate space filled with a heat-transporting liquid and, on the other, it is equipped with means for heating the coolant.
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