发明名称 |
Sulfonamide-Containing Topcoat and Photoresist Additive Compositions and Methods of Use |
摘要 |
Provided are sulfonamide-containing compositions, topcoat polymers, and additive polymers for use in lithographic processes that have improved static receding water contact angles over those known in the art. The sulfonamide-containing topcoat polymers and additive polymers of the present invention include sulfonamide-substituted repeat units with branched linking group as shown in Formula (I):
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申请公布号 |
US2011207051(A1) |
申请公布日期 |
2011.08.25 |
申请号 |
US20100709277 |
申请日期 |
2010.02.19 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION;CENTRAL GLASS CO., LTD |
发明人 |
SANDERS DANIEL PAUL;FUJIWARA MASAKI;TERUI YOSHIHARU |
分类号 |
G03F7/027;C08F265/06;C09D133/12;G03F7/20 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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