METHOD OF GENERATING PHOTOMASK DATA, METHOD OF FABRICATING PHOTOMASK, PROGRAM FOR GENERATING PHOTOMASK DATA, METHOD OF MANUFACTURING SOLID-STATE IMAGING APPARATUS, AND METHOD OF MANUFACTURING MICROLENS ARRAY

摘要

PROBLEM TO BE SOLVED: To prevent a boundary portion between microlenses from being smoothed.

SOLUTION: A photomask includes a microlens pattern including light-shielding portions and non-light-shielding portions for forming a microlens, in each of a plurality of rectangular regions 210 two-dimensionally arranged. Each rectangular region 210 includes a frame region 230 having four sides of the rectangular region 210 as outer edges and a primary region 240 having boundaries that are inner edges of the frame region 230. The frame region 230 is configured by four strip regions 231 to 234 each including one of the four sides as a part of the outline, and a width W between the outer edge and the inner edge of the frame region 230 is not more than 1/2 of a wavelength of exposure light used in photolithography. A density of light-shielding portions defined by (area of the light-shielding portion)/((area of the light-shielding portion)+(area of non-light-shielding portion)) is 0% or more and 15% or less.

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