POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND LIQUID-REPELLENT FILM

摘要

Provided is a positive photosensitive resin composition for use in liquid-crystal display elements and organic EL display elements etc., wherein the surfaces of cured films have high water repellency and high oil repellency even after being treated by plasma etc., it is possible to form images on cured films having insulating properties, good images can be maintained with no reflow etc. during film curing, and cured films have good reworkability. The positive photosensitive resin composition contains components (A), (B), (C), and (D). Component (A) is an acrylic polymer that has acid dissociating groups, aliphatic hydroxyl groups, and N-substituted maleimide groups, component (B) is an acrylic polymer that has acid dissociating groups and blocked isocyanate groups, component (C) is an acrylic polymer that has acid dissociating groups, aliphatic hydroxyl groups, C3-10 fluoroalkyl groups, and silyl ether groups, and component (D) is a photoacid generator.