发明名称 DARK-FIELD DEFECT INSPECTION METHOD, DARK-FIELD DEFECT INSPECTION DEVICE, ABERRATION ANALYSIS METHOD AND ABERRATION ANALYSIS DEVICE
摘要 <p>By including an illumination system and a detection system, an information collecting function of monitoring an environment, such as temperature and atmospheric pressure, and an apparatus state managing function having a feedback function of comparing the monitoring result and a design value, a theoretical calculation value or an ideal value derived from simulation results and calibrating an apparatus so that the monitoring result is brought close to the ideal value, a unit for keeping the apparatus state and apparatus sensitivity constant is provided. A control unit 800 is configured to include a recording unit 801, a comparing unit 802, a sensitivity predicting unit 803, and a feedback control unit 804. In the comparing unit 802, the monitoring result transmitted from the recording unit 801 and an ideal value stored in a database 805 are compared with each other. When a difference between the ideal value and the monitoring result exceeds a predetermined threshold, the feedback control unit 804 corrects the illumination system and the detection system.</p>
申请公布号 KR20110086737(A) 申请公布日期 2011.07.29
申请号 KR20117013881 申请日期 2010.01.20
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 TANIGUCHI ATSUSHI;UENO TAKETO;SHIBATA YUKIHIRO;MAEDA SHUNJI;MATSUI TETSUYA
分类号 G01N21/956;G01M11/02;G01N21/93;G01N21/95 主分类号 G01N21/956
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