发明名称 METHOD FOR MANUFACTURING SUBSTRATE FOR LIQUID DISCHARGE HEAD
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate for a liquid discharge head in which an ink feed opening can be simply manufactured in a short time. SOLUTION: There is provided a method for manufacturing a liquid discharge head which has a silicon substrate 1 having a first surface in which an element for generating energy used for discharging a liquid is provided and a second surface which is the back side of the first surface, and a supply port 13 for supplying the liquid to the element through the silicon substrate 1. The method includes the steps of: providing the silicon substrate 1 in which a layer 4 is provided on the second surface, wherein the layer 4 comprises a material having a lower etching rate than silicon against an etchant for wet-etching silicon; partially removing the layer 4 so that a silicon-exposed part in the second surface may be a shape of a frame to form part on the second surface; and wet-etching the silicon substrate 1 using the etchant from the part toward the first surface to form the supply port 13 in the silicon substrate 1. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011143701(A) 申请公布日期 2011.07.28
申请号 JP20100034693 申请日期 2010.02.19
申请人 CANON INC 发明人 MATSUMOTO KEIJI;KOYAMA SHUJI;ABO HIROYUKI;WATANABE KEIJI
分类号 B41J2/16 主分类号 B41J2/16
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