| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a more inexpensive, simpler and more robust system when a SOCOMO system is incorporated in an EUV lithography system. <P>SOLUTION: An LPP target system 40 includes an Sn pellet (droplet) source 20. The Sn pellet (droplet) source 20 discharges an Sn pellet (droplet) 22. The Sn pellet (droplet) 22 is a pellet of relatively low mass, and generates substantially isotropic EUV 30 when irradiated with a laser light beam 13. Consequently, a multilayer shell type GIC mirror MG can be disposed between an LPP 24 and an intermediate focus IF along an optical axis A1. A lens 17 converges the laser light beam 13 on the focus F 13. <P>COPYRIGHT: (C)2011,JPO&INPIT |
