发明名称 MONITORING MODULE INCLUDING E-FIELD INDUCED ESD SENSITIVE PATTERN, AND PHOTOMASK INCLUDING THE MONITORING MODULE
摘要 <p>PURPOSE: An electrostatic discharge(ESD)-sensitive monitoring module under external electric field and a photo-mask including the module are provided to maximize the probability of the generation of ESD, induced by the external electric field, by designing monitoring patterns to directions matched or vertical to the external electric field. CONSTITUTION: A plurality of monitoring patterns(110) which is electrically isolated is orthogonally arranged in the ESD monitoring module of a photo-mask. The monitoring patters are formed in a bar shape. The lengths of the monitoring patterns are relatively longer than the widths of the monitoring patterns. The photo-mask includes a transparent substrate and a light shielding pattern. The light shielding pattern is composed of the monitoring module and a blind region which is arranged around the monitoring module.</p>
申请公布号 KR20110083418(A) 申请公布日期 2011.07.20
申请号 KR20100003630 申请日期 2010.01.14
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, SU YOUNG;SHIN, IN KYUN;JEONG, YUN SONG
分类号 G03F1/00;H01L21/027;H01L21/66;H01L23/60 主分类号 G03F1/00
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