发明名称 GROUP III-V COMPOUND SEMICONDUCTOR LIGHT RECEIVING ELEMENT, METHOD FOR MANUFACTURING GROUP III-V COMPOUND SEMICONDUCTOR LIGHT RECEIVING ELEMENT, LIGHT RECEIVING ELEMENT, AND EPITAXIAL WAFER
摘要 <p>An object of the present invention is to provide a group III-V compound semiconductor photo detector comprising an absorption layer having a group III-V compound semiconductor layer containing Sb as a group V constituent element, and an n-type InP window layer, resulting in reduced dark current. The InP layer 23 grown on the absorption layer 23 contains antimony as impurity, due to the memory effect with antimony which is supplied during the growth of a GaAsSb layer of the absorption layer 21. In the group III-V compound semiconductor photo detector 11, the InP layer 23 contains antimony as impurity and is doped with silicon as n-type dopant. Although antimony impurities in the InP layer 23 generate holes, the silicon contained in the InP layer 23 compensates for the generated carriers. As a result, the second portion 23d of the InP layer 23 has sufficient n-type conductivity.</p>
申请公布号 KR20110081264(A) 申请公布日期 2011.07.13
申请号 KR20117010094 申请日期 2010.07.21
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 AKITA KATSUSHI;ISHIZUKA TAKASHI;FUJII KEI;NAGAI YOUICHI
分类号 H01L31/10 主分类号 H01L31/10
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