METHOD OF DRYING A SUBSTRATE AND APPARATUS FOR DRYING A SUBSTRATE

摘要

PURPOSE: A method of drying a substrate and an apparatus for drying a substrate are provided to stably dry a substrate by preventing the substrate from being naturally dried before being dried through supercritical fluid. CONSTITUTION: In a method of drying a substrate and an apparatus for drying a substrate, liquid medicine is supplied to a substrate to maintain a substrate wet passing a cleaning process. A wet substrate is transferred inside a pressure chamber(120). The liquid medicine is supplied to the pressure chamber to maintain the substrate wet. A dry gas is transformed to generate supercritical fluid to dry the substrate. The supercritical fluid is supplied inside the pressure chamber to dry the substrate.