| 摘要 |
PURPOSE: A manufacturing method of surface plasmon color filter is provided to reduce the process cost since photoresist, which is induced in the specific wave range by not passing through the lithographic process, is not necessary by using surface plasmon phenomenon, and to reduce process required time by simplifying the process technology. CONSTITUTION: The self-assembled monolayer is formed on the substrate(110). The dispersed solution including nanosphere and additive is dropped on the self-assembled monolayer. The nanosphere single layer on uniform two dimensional is formed on the self-assembled monolayer. The first etching process forming the nanosphere pattern (132a) is proceeded by reducing the size of the nanosphere. The metallic foil(120) is evaporated in the top of the substrate in which the nanosphere pattern is formed. The second etching process forming the metal pattern (120a) and hole(122) is proceeded by removing the nanosphere pattern.
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