| 摘要 |
PURPOSE: A cleaning method using a dual filter is provided to eliminate residues generated on wafers by implementing a cleaning process without the shutdown of equipments. CONSTITUTION: Two filters(306, 308) are arranged for nitride strip processing equipments. Pressure sensors(310, 312) are arranged at the front side of the filters. A pneumatic valve controlling each valve for an HF supplying line, a H_3PO_4 circulating line, and a drain line is installed at the nitride strip processing equipments. The pressure of each filter is monitored by the pressure sensor. Based on the monitored pressure, a filtering cleaning process with respect to one filter is implemented.
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