发明名称 |
BLOCK COPOLYMER-ASSISTED NANOLITHOGRAPHY |
摘要 |
In accordance with an embodiment of the disclosure, a method for forming submicron size nanostructures on a substrate surface includes contacting a substrate with a tip coated with an ink comprising a block copolymer matrix and a nanostructure precursor to form a printed feature comprising the block copolymer matrix and the nanostructure precursor on the substrate, and reducing the nanostructure precursor of the printed feature to form a nanostructure having a diameter (or line width) of less than 1μm.
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申请公布号 |
US2011165341(A1) |
申请公布日期 |
2011.07.07 |
申请号 |
US20100959105 |
申请日期 |
2010.12.02 |
申请人 |
NORTHWESTERN UNIVERSITY |
发明人 |
MIRKIN CHAD A.;CHAI JINAN;HUO FENGWEI;ZHENG ZIJIAN;GIAM LOUISE R. |
分类号 |
B05D5/00;B05D1/28;B05D3/10;B82Y40/00;B82Y99/00 |
主分类号 |
B05D5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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