发明名称 RELIABILITY OF BACK END OF LINE PROCESS BY ADDING PVD OXIDE FILM
摘要 A method and apparatus for forming a protective coating on a photovoltaic device is provided. The photovoltaic device is formed by depositing photoelectric conversion units on a substrate, and by forming conductive layers and contacts on the photoelectric conversion units. The protective coating is formed by a deposition process, such as physical or chemical vapor deposition.
申请公布号 US2011162704(A1) 申请公布日期 2011.07.07
申请号 US20100965251 申请日期 2010.12.10
申请人 APPLIED MATERIALS, INC. 发明人 LE HIEN-MINH HUU;HASSAN MOHD FADZLI ANWAR;TANNER DAVID
分类号 H01L31/0216;C23C14/34;H01L31/18 主分类号 H01L31/0216
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