发明名称 |
RELIABILITY OF BACK END OF LINE PROCESS BY ADDING PVD OXIDE FILM |
摘要 |
A method and apparatus for forming a protective coating on a photovoltaic device is provided. The photovoltaic device is formed by depositing photoelectric conversion units on a substrate, and by forming conductive layers and contacts on the photoelectric conversion units. The protective coating is formed by a deposition process, such as physical or chemical vapor deposition.
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申请公布号 |
US2011162704(A1) |
申请公布日期 |
2011.07.07 |
申请号 |
US20100965251 |
申请日期 |
2010.12.10 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LE HIEN-MINH HUU;HASSAN MOHD FADZLI ANWAR;TANNER DAVID |
分类号 |
H01L31/0216;C23C14/34;H01L31/18 |
主分类号 |
H01L31/0216 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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