| 发明名称 |
CHEMICAL LIQUID SUPPLY NOZZLE AND CHEMICAL LIQUID SUPPLY METHOD |
| 摘要 |
<p>PURPOSE: A chemical liquid supply nozzle and a chemical liquid supply method are provided to suppress a drying effect of a chemical liquid by using a low cost. CONSTITUTION: A nozzle body(51) is connected to a front end part of a flow path member for transferring a chemical liquid. A chemical liquid flow path(52) is installed at the nozzle body. The chemical liquid flow path is used for circulating the chemical liquid supplied from the flow path member. A cutoff valve(62) is installed at the chemical liquid flow path. The cutoff valve is used for closing or opening the chemical liquid flow path.</p> |
| 申请公布号 |
KR20110074657(A) |
申请公布日期 |
2011.07.01 |
| 申请号 |
KR20100108072 |
申请日期 |
2010.11.02 |
| 申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
NAKASHIMA TSUNENAGA;HAYASHI SHINICHI;FUJIMOTO AKIHIRO;OOKUBO TAKAHIRO |
| 分类号 |
H01L21/027;H01L21/302 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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