发明名称 THIN FILM DEPOSITION EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide thin film deposition equipment which can deposit a thin film on an uniform substrate while facilitating manufacturing and maintenance, and can prolong a life of a shower plate while reducing manufacturing cost and maintenance cost. SOLUTION: In the thin film deposition equipment including pair electrodes composed of a high frequency electrode 3 and a ground electrode facing each other in a vacuum container where the ground electrode supports a substrate, the vacuum container is filled with gas, and a thin film is deposited on the substrate by applying a high frequency between the pair electrodes, a plurality of planar members 7a and 7b are arranged at the surface 3a side of the high frequency electrode 3 while being superimposed in the thickness direction, the plurality of planar members 7a and 7b are provided with a plurality of pore openings so that gas can be discharged from the surface 3a, diameters of the pore openings in the planar members 7a and 7b are different from each other, and each of the plurality of planar members 7a and 7b is configured to be detachable. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011129618(A) 申请公布日期 2011.06.30
申请号 JP20090285028 申请日期 2009.12.16
申请人 FUJI ELECTRIC CO LTD 发明人 TOKOI KAZUYO;WADA KATSUHITO
分类号 H01L21/31;C23C16/455;H01L21/205 主分类号 H01L21/31
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