| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus that reduces an latent harmful influence of a droplet left on a sensor and/or a target for the sensor. <P>SOLUTION: An immersion lithographic apparatus is disclosed that includes a table having a surface and the sensor, or the target for the sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, wherein the liquid displacement device includes a gas outlet opening configured to direct a gas flow toward the first and second areas. A property of a part of the gas flow introduced into the first area is different from a property of a part of the gas flow introduced into the second area. <P>COPYRIGHT: (C)2011,JPO&INPIT |
