| 摘要 |
The present invention provides an exposure apparatus for intermittently irradiating light from a light source to a TFT substrate through a photomask while conveying the TFT substrate in one direction, and forming an exposure pattern on the TFT substrate corresponding to a plurality of mask patterns formed on the photomask. On one surface of the photomask, electrode wiring patterns and signal wiring patterns requiring different resolutions are formed and an electrode wiring pattern group including a plurality of electrode wiring patterns and a signal wiring pattern group including a plurality of signal wiring patterns are formed in front and back in the conveying direction of the TFT substrate, and on the other surface of the photomask, micro-lenses which reduce and project the electrode wiring patterns requiring a high resolution onto the TFT substrate are formed. The photomask is disposed so that the micro-lenses face the TFT substrate. |
