摘要 |
<p>PURPOSE: A mask pattern generating method, mask pattern generating program, and semiconductor device manufacturing method are provided to prevent the taper shape of the section of a core pattern or a transfer pattern, thereby increasing the yield of a semiconductor device. CONSTITUTION: A controller(10) comprises a CPU(Central Processing Unit)(100), a RAM(Random Access Memory)(101), and a ROM(Read Only Memory)(102). An input unit(12) comprises an input terminal such as a USB(Universal Serial Bus) terminal. An output unit(14) outputs mask pattern data(23). A display unit(18) displays a result calculated by the CPU. A memory unit(20) memorizes layout data(201).</p> |