发明名称 METHOD OF GENERATING MASK PATTERN, MASK PATTERN GENERATING PROGRAM, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p>PURPOSE: A mask pattern generating method, mask pattern generating program, and semiconductor device manufacturing method are provided to prevent the taper shape of the section of a core pattern or a transfer pattern, thereby increasing the yield of a semiconductor device. CONSTITUTION: A controller(10) comprises a CPU(Central Processing Unit)(100), a RAM(Random Access Memory)(101), and a ROM(Read Only Memory)(102). An input unit(12) comprises an input terminal such as a USB(Universal Serial Bus) terminal. An output unit(14) outputs mask pattern data(23). A display unit(18) displays a result calculated by the CPU. A memory unit(20) memorizes layout data(201).</p>
申请公布号 KR20110070822(A) 申请公布日期 2011.06.24
申请号 KR20100129867 申请日期 2010.12.17
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 ABURADA RYOTA;KOTANI TOSHIYA
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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