MASK MATERIAL COMPOSITION, METHOD FOR FORMING OF IMPURITY DIFFUSED LAYER, AND SOLAR CELL

摘要

PROBLEM TO BE SOLVED: To provide a mask material composition that is suitably adoptable for a mask formed for diffusion barrier of an impurity diffusing component diffusing into a semiconductor substrate; a method for forming an impurity diffusing layer using the mask material composition; and a solar battery.

SOLUTION: This mask material composition is used for diffusion barrier of an impurity diffusing component into a semiconductor substrate, and includes a siloxane resin (A1) containing a constituent unit represented by formula (a1), where in the formula (a1), R1is a single bond or 1-5C alkylene group; and R2is a 6-20C aryl group.

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