发明名称 SOLID STATE IMAGING DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <p>PURPOSE: A solid photographing device and manufacturing method are provided to shorten the distances between a lens and the semiconductor area of a light receiving sensor unit, thereby preventing color mixture. CONSTITUTION: A light sensor unit is formed in a silicon layer(4). A first support substrate(2) includes a bonding layer on the silicon layer. A wire unit is formed on the silicon layer. A second support substrate is bonded with the wire unit. A reflection preventing film, a color filter(5), and an on-chip lens(6) are successively formed on the silicon layer.</p>
申请公布号 KR20110063626(A) 申请公布日期 2011.06.13
申请号 KR20110052100 申请日期 2011.05.31
申请人 SONY CORPORATION 发明人 MARUYAMA YASUSHI;ABE HIDESHI;MORI HIROYUKI
分类号 H01L27/14;H01L21/00;H01L23/00;H01L27/146;H01L29/74;H01L31/00 主分类号 H01L27/14
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