| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photoacid generator having high developability, a cationic polymerization initiator having high curability, a resist composition and a cationically polymerizable composition using them. <P>SOLUTION: An aromatic sulfonium salt compound represented by general formula (I) (wherein R<SP>1</SP>-R<SP>10</SP>are each 1-18C alkyl which is unsubstituted or contains a substituent, or the like; R<SP>11</SP>-R<SP>17</SP>are each 1-18C alkyl which is unsubstituted or contains a substituent, or the like; R<SP>18</SP>is 1-18C alkyl which is unsubstituted or contains a substituent, or the like; and X<SB>1</SB><SP>-</SP>is a monovalent anion) is used as a photoacid generator or a cationic polymerization initiator. <P>COPYRIGHT: (C)2011,JPO&INPIT |
