Coating compositions suitable for use with an overcoated photoresist
摘要
<p>Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.</p>
申请公布号
EP2216683(A3)
申请公布日期
2011.06.01
申请号
EP20100152673
申请日期
2010.02.04
申请人
ROHM AND HAAS ELECTRONIC MATERIALS, LLC
发明人
CAMERON, JAMES F.;SUNG, JIN WUK;AMARA, JOHN P.;PROKOPOWICZ, GREGORY P.;VALEI, DAVID A.