| 摘要 |
<p>Provided is an exposure method wherein, after exposure of the first exposure region (9) of a subject to be exposed (8) is completed using the first mask pattern group (12) of a photomask (11), while transferring the subject to be exposed (8) in the arrow A direction, light emitted from a light source is interrupted by moving a shutter (5) in synchronization with the transfer speed of the subject (8) to be exposed, the subject to be exposed (8) is returned in the arrow D direction by the distance the subject to be exposed (8) has moved during a time when the shutter (5) moved, and the mask pattern group is switched to the second mask pattern group (13) by moving the photomask (11). When the switching of the mask pattern group of the photomask (11) is completed, transfer of the subject to be exposed (8) in the arrow A direction is restarted, and at the same time, the shutter (5) is moved in the arrow B direction in synchronization with the transfer speed of the subject to be exposed (8) and interruption of light emitted from the light source is stopped, and exposure of the second exposure region (10) is performed. Thus, efficiency of forming the plurality of kinds of exposure patterns on the same subject to be exposed is improved.</p> |
