APPARATUS OF PROCESSING A SUBSTRATE

摘要

PURPOSE: An apparatus of processing a substrate is provided to suppress the contamination of a substrate processing apparatus by efficiently removing the particles from the substrate. CONSTITUTION: In an apparatus of processing a substrate, an index(110) comprises a load port(112) supporting a carrier(114). A load lock chamber(120) is connected to the index. A transfer unit(130) transfers the substrate between load lock chambers. Process chambers(151-154) process the substrate which is transferred by the transfer unit. A particle removal unit(160) removes particles from the substrate.