发明名称 |
ARRAY SUBSTRATE, PROCESS FOR PRODUCTION THEREOF, AND DISPLAY DEVICE |
摘要 |
<p>Disclosed are: an array substrate which ensures the reflow of a resist film onto a channel region to prevent the occurrence of defects in the channel region and enables the prevention of the spreading of a resist mask to a region outside of the channel region; a process for producing the array substrate; and a display device. A TFT (15) can be formed in the following manner: a flow-promoting layer (51) is formed on the entire surface of a substrate, a region of the flow-promoting layer (51) outside of a region corresponding to a channel region (Q) of a semiconductor film (20) is decomposed and removed by the irradiation with ultraviolet ray to form the flow-promoting layer (51) only on the channel region (Q), a resist film (28) is reflowed onto the channel region (Q) to form a reflow resist film (42), and the resulting product is etched to form the semiconductor film (20) in an island-like shape.</p> |
申请公布号 |
WO2011061976(A1) |
申请公布日期 |
2011.05.26 |
申请号 |
WO2010JP63265 |
申请日期 |
2010.08.05 |
申请人 |
SHARP KABUSHIKI KAISHA;OKI, ICHIROH |
发明人 |
OKI, ICHIROH |
分类号 |
H01L21/336;G02F1/1368;G09F9/30;H01L29/786 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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