发明名称 |
METHOD FOR DRY CLEANING PLASMA PROCESSING APPARATUS |
摘要 |
This dry cleaning method for a plasma processing apparatus is a dry cleaning method for a plasma processing apparatus that includes: a vacuum container provided with a dielectric member; a planar electrode and a high-frequency antenna that are provided outside the dielectric member; and a high-frequency power source that supplies high-frequency power to both the high-frequency antenna and the planar electrode, to thereby introduce high-frequency power into the vacuum container via the dielectric member and produce an inductively-coupled plasma, the method comprising the steps of: introducing a gas including fluorine into the vacuum container and also introducing high-frequency power into the vacuum container from the high-frequency power source, to thereby produce an inductively-coupled plasma in the gas including fluorine; and by use of the inductively-coupled plasma, removing a product including at least one of a precious metal and a ferroelectric that is adhered to the dielectric member. |
申请公布号 |
EP2157601(A4) |
申请公布日期 |
2011.05.18 |
申请号 |
EP20080764810 |
申请日期 |
2008.05.28 |
申请人 |
ULVAC, INC. |
发明人 |
UEDA, MASAHISA;KOKAZE, YUTAKA;ENDOU, MITSUHIRO;SUU, KOUKOU |
分类号 |
H01L21/3065;H01L21/8246;H01L27/105;H01L41/187;H01L41/22 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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