发明名称 Substrate supporting means having wire and apparatus using the same
摘要 An apparatus includes: a process chamber for treating a substrate; a susceptor in the process chamber; a supporting frame over the susceptor; and at least one wire connected to the supporting frame.
申请公布号 US7942623(B2) 申请公布日期 2011.05.17
申请号 US20100824956 申请日期 2010.06.28
申请人 JUSUNG ENGINEERING CO. LTD. 发明人 HWANG CHUL-JOO;LEE SANG-DO
分类号 H01L21/677;C23C16/00;C23C16/458;C23F1/00;G02F1/133;H01L21/687 主分类号 H01L21/677
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