DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME

摘要

PURPOSE: A display device and manufacturing method of a display device is provided to prevent a imperfect crystallization of an amorphous silicon film. CONSTITUTION: A display device(1) includes a substrate(10), a semiconductor layer(30), an optical shielding layer(50), a gate insulating layer(60), and a gate electrode(70). The semiconductor is formed on the substrate. The optical shielding layer is formed on the same layer with the semiconductor. The gate insulating layer is formed on the substrate including the semiconductor and the optically shielding layer. The gate electrode is formed corresponding to the gate insulating layer with the channel area of the semiconductor.