发明名称 Barrier film material and pattern formation method using the same
摘要 A barrier film material includes, in addition to an alkali-soluble polymer, a multivalent carboxylic acid compound having a plurality of carboxyl groups or a multivalent alcohol compound. Thus, the multivalent carboxylic acid compound or the multivalent alcohol compound is adhered onto the surface of a resist film, and hence, particles having been adhered to the surface of the resist film are removed in removing the barrier film. Also, in the case where the barrier film is removed simultaneously with development, the resist film can be prevented from remaining partly undissolved.
申请公布号 US7939242(B2) 申请公布日期 2011.05.10
申请号 US20080046996 申请日期 2008.03.12
申请人 PANASONIC CORPORATION 发明人 ENDO MASAYUKI;SASAGO MASARU
分类号 G03F7/00;G03F7/004;G03F7/11;G03F7/20;G03F7/26;G03F7/40;H01L21/027 主分类号 G03F7/00
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