发明名称 LASER SYSTEM AND LASER EXPOSURE SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To provide a laser system or laser exposure system that can increase a dynamic range of laser output without making energy stability worse by pulse. <P>SOLUTION: A main controller 70 of a laser device 1 performs charging voltage control and gas control, so that pulse energy Pin to be input to an output attenuating mechanism 50 may reach a value (target pulse energy PL) at which pulse variance becomes small. Further, transmittance T of the output attenuating mechanism 50 is controlled on the basis of a signal transmitted from an exposure device 200 and indicating the target pulse energy Pt so that output energy of the laser device 1 may reach target pulse energy Pt (<target pulse energy PL) required in the exposure device 200. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011091416(A) 申请公布日期 2011.05.06
申请号 JP20100271462 申请日期 2010.12.06
申请人 KOMATSU LTD;USHIO INC 发明人 WAKABAYASHI OSAMU;NAGAI SHINJI;INOUE TOYOJI
分类号 H01S3/134;H01L21/027 主分类号 H01S3/134
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