发明名称 WAFER PROCESSING METHOD WITHOUT OCCURRENCE OF DAMAGE TO DEVICE AREA
摘要 A wafer processing method of processing a wafer having on a front surface a device area where a plurality of devices are formed by being sectioned by predetermined dividing lines, and an outer circumferential redundant area surrounding the device area, includes the steps of: sticking a protection tape to the front surface of the wafer; holding a protection tape side of the wafer by a rotatable chuck table, positioning a cutting blade on a rear surface of the wafer, and rotating the chuck table to cut a boundary portion between the device area and the outer circumferential redundant area to form a separation groove; grinding only the rear surface of the wafer corresponding to the device area to form a circular recessed portion to leave the ring-like outer circumferential redundant area as a ring-like reinforcing portion, the wafer being such that the device area and the ring-like outer circumferential redundant area are united by the protection tape; and conveying the wafer supported by the ring-like reinforcing portion via the protection tape.
申请公布号 US2011097852(A1) 申请公布日期 2011.04.28
申请号 US20100902311 申请日期 2010.10.12
申请人 DISCO CORPORATION 发明人 SEKIYA KAZUMA
分类号 H01L21/78 主分类号 H01L21/78
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