| 摘要 |
The invention is aimed at devising a direct application symbol mark (SMPN) which is for example two-dimensional, in which the information elements, for example depressions of the needle impact mark or regions processed by laser radiation in laser engraving using the methods described in the invention are filled with fluorescent dyes which absorb radiation at wavelengths for example either up to the short-wave transmission edge of the filter of the reader, for example in the 250-600 nm range, and which radiate in the wavelength range of the passband of the receiving channel of the reader, for example 600-700 nm, or which absorb radiation at wavelengths greater than the long wave transmission edge of the filter of the reader, for example in the 700 nm-10 micron range, and which radiate in the wavelength range of the passband of the input filter of the reader, for example 600-700 nm.
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